The Limited Palette for Photonic Block‐Copolymer Materials: A Historical Problem or a Practical Limitation?

Block-copolymer self-assembly has proven to be an effective route for the fabrication of photonic films and, more recently, pigments. However, despite extensive research on this topic over past two decades, palette monomers and polymers employed produce such structurally colored materials remained surprisingly limited. In Scientific Perspective, commonly used block-copolymer systems reported in literature are summarized (considering both linear brush architectures) their use is rationalized from point view historical development physicochemical constraints. Finally, current challenges facing field discussed promising new areas highlighted inspire community pursue directions.